Dr. Helmut Schift
Paul Scherrer Institute, CH
Wednesday, March 25
15:30
Abstract
Nanoimprint Lithography – from Wafers to Chips
When nanoimprint lithography (NIL) was presented 30 years ago as next generation lithography, it was revolutionary in many ways. As mechanical approach to semiconductor patterning, its 10 nm resolution in resist material was beyond imagination for a parallel method, its ability to transfer a pattern onto silicon substrates made it a competitor for high-volume manufacturing of semiconductor chips. At PSI, we were able to contribute to its foundations, and developed a range of processes for various applications. In my talk I want to present NIL as a toolbox approach, with an emphasis on its foundations and on hybrid processing.
Biography
Helmut Schift studied electrical engineering at the University of Karlsruhe and performed his Ph.D. studies at the Institute of Microtechnology Mainz, Germany. After his graduation in 1994, he joined the Paul Scherrer Institute. He is head of the Advanced Nanomanufacturing Group in the Laboratory of Nano and Quantum Technologies. As one of the pioneers in nanoimprint lithography (NIL), he has developed enabling techniques for the patterning of functional surfaces with topological and chemical surface contrast. H. Schift is member of the steering board of the Nanoprint and Nanoimprint Technology (NNT). At MNE 2026, he is acting as program co-chair.