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Dr. Marta Fernández Regúlez

Institute of Microelectronics of Barcelona (IMB-CNM, CSIC), ES

Dr. Marta Fernández Regúlez is a senior researcher in the NanoNEMS group at IMB CNM (CSIC), working on advanced micro and nanofabrication technologies for emerging device platforms. She holds a degree in Physics from the University of Valladolid and a PhD in Electronic Engineering from the Autonomous University of Barcelona, and has carried out research stays at UC Berkeley and CEA Leti. Her work focuses on hybrid lithography approaches that combine top down and bottom up strategies for nanoscale patterning, including directed self assembly of block copolymers and advanced infiltration-based processes. Her research explores how these technologies can enable new capabilities in semiconductor nanopatterning, quantum device architectures, nanoelectronics and sensors.
Wednesday, March 25
12:00

Abstract

Thermal Scanning Probe Lithography as High-Precision Platform for Quantum Device Nanofabrication

Thermal scanning probe lithography (t-SPL) offers exceptionally high placement accuracy, charge free patterning and reliable alignment to pre existing nanostructures, making it a compelling alternative to conventional lithography approaches for quantum device fabrication. In this talk, I will present recent work demonstrating the capabilities of t-SPL for defining contact patterns on advanced semiconductor quantum device platforms, highlighting its strengths in overlay precision. Building on these results, I will show how t-SPL can be combined with the complementary patterning strategies to further expand nanoscale design capabilities, enabling additional control over feature geometry opening new avenues in emerging quantum technologies.

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Biography

Dr. Marta Fernández Regúlez is a senior researcher in the NanoNEMS group at IMB CNM (CSIC), working on advanced micro and nanofabrication technologies for emerging device platforms. She holds a degree in Physics from the University of Valladolid and a PhD in Electronic Engineering from the Autonomous University of Barcelona, and has carried out research stays at UC Berkeley and CEA Leti. Her work focuses on hybrid lithography approaches that combine top down and bottom up strategies for nanoscale patterning, including directed self assembly of block copolymers and advanced infiltration-based processes. Her research explores how these technologies can enable new capabilities in semiconductor nanopatterning, quantum device architectures, nanoelectronics and sensors.

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