Prof. Dr. Robert Szoszkiewicz
University of Warsaw, PL
Thursday, March 26
12:30
Abstract
Thermochemical Nanolithography of 2D MoS2 and CrSBr
We extend the thermochemical nanolithography (TCNL) capabilities towards thermally-induced modifications of thin MoS2 and CrSBr flakes in air. We perform atomic force microscopy studies and thermal TCNL calibration with Raman spectroscopy as well as analytic heat-flow models. While TCNL cannot provide enough temperature to thermally oxidize and etch the basal planes of such flakes, it can deform the underlying Si and SiO2 substrates and pattern the surfaces of 2D materials in some specific cases. In particular, TCNL enables thermally-induced deposition of Cr oxides/hydroxides onto CrSBr basal planes in a new, reversed patterning scheme. It is also able to pattern already oxidized MoS2 layers and flakes in air.
Biography
Robert Szoszkiwicz is a full professor of physical chemistry at the University of Warsaw, Poland. Previously, he was a STEM Impact Fulbright Fellow and a visiting professor at the University Kansas. He holds a PhD from EPFL, which was followed by post-doctoral stays at Georgia Institute of Technology and Columbia University, USA. His research focus is on nanomechanics of single protein molecules as well as physico-chemical characterization of arbitrary surfaces mainly via atomic force microscopy. Currently, he is applying his deep expertise to local mechanisms of selected reactions onto surfaces of 2D materials, developing original methods of learning about structural changes within single biological molecules from changes of their nanomechanical properties.